Wafer
Polishing/Electronics Industry
More stringent requirements for polishing solutions
has created a need for premium products for this application. The
answer REMET has found is Syton® HT-50.
REMET distributes Syton® HT-50, which is an aqueous
colloidal silica and an excellent choice for use as a base material
in the prime silicon wafer polishing process.
This product has an average particle size of 40 nm
and is sodium stabilized. In addition, it has one of the lowest metal
contents of any commercially available colloidal silica.
Uses for this product range from: crystal manufacturing
for filtration in electronics, optics and acoustics; to sapphire
rod & blanks, optoelectronics and high output LED; to proprietary
polishing solutions; and finally, to ultra-flat silicon, SOI and
GOI substrates for microelectronic and optoelectronic applications.
Typical Properties for Syton® HT-50 are as follows:
| Property |
Typical Value |
| Specific Gravity @ 20°C (gm/cm3) |
1.390 |
| SiO2 (weight %) |
49.8 |
| pH @ 20°C |
10.2 |
| Average Particle Size (nm) |
40.0 |
| Trace Metals |
|
| Iron |
15.0 (ppm) |
| Aluminum |
55.0 (ppm) |
| Copper |
40.0 (ppb) |
| Chromium |
350 (ppb) |
| Nickel |
130 (ppb) |
For more information about Syton® HT-50 and how
it might be able to help with your particular application(s), please
call your local REMET representative or e-mail us.
Syton is a registered trademark of the DuPont Corporation. |